OET provides practical industry solutions to achieve a strong productivity improvement for OE devices production by developing sophisticated non-destructive and robust in-line metrology and control solutions for R2R printing and Vaccum processes for traceable measurement of properties and quality of highly integrated nano-layers and devices during their fabrication.
With more than 25 years of experience, OET delivers advanced solutions in optical metrology methodologies and instrumentation for the in-situ, in-line and real-time optical investigation of inorganic, organic and hybrid nanomaterials deposited by vacuum and printing methods.
Specifically, OET’s expertise encompasses the use of ultra fast in-line optical metrology tools like Spectroscopic Ellipsometry (SE) and Raman Spectroscopy (RS), enabling the real-time control on the process stability, properties homogeneity, material/device quality and performance reliability in R2R printing and Gas Transport Pilot and Production lines.
Why Spectroscopic Ellipsometry & Raman Spectroscopy for In-Line Optical Metrology?
- Robust & Non-destructive
- Monitoring sub-nm precision Film Thickness
- Measuring Optical Properties
- Surface Roughness with nm precision
- Interfacial Mixing
- Composition & Bonding structure
- Crystallinity & Stoichiometry
- Optical Anisotropy
- Depth and Area Uniformity
- Growth Mechanisms
- Deposition Rate